Ultrasonic Spray Coating of Photoresist for MEMS Wafers

Ultrasonic Spray Of Photoresist For MEMS Wafers And Other Substrates With Varying Topographies

Ultrasonic spray is a simple, economical and repeatable process for photoresist coatings in photolithography wafer processing. Sono-Tek ultrasonic coating systems enable fine control of flow rate, coating speed, and deposition amount using an advanced layering technique. Low velocity spray shaping defines the atomized spray into precise, controllable patterns, avoiding overspray while producing very thin, uniform layers. Direct spray coating using ultrasonic technology is proven to be a reliable and effective method for depositing photoresist onto 3D microstructures, resulting in reduced device failure from overexposure of the metal to etchant.

SW Systems is a Sonotek ultrasonic coating equipment sales representative company in the states of Texas, Oklahoma, Arkansas and Louisiana. We also cover the country of Mexico.